FIB- Focused Ion Beam is part of the Characterization Laboratory infrastructure at ITU Surface Lab. This page summarizes where the device sits in the laboratory workflow, what kind of measurements or process steps it supports, and why it matters in applied surface engineering studies.
In practice, the device is used to compare coating behavior, process stability, microstructural response, or surface-related performance outputs under controlled research conditions. The goal is not only to list the equipment, but to clarify the role it plays in experiment design and interpretation.
The summary, metadata cards, and detailed content below connect the device to real laboratory questions such as deposition strategy, corrosion response, tribological performance, characterization depth, or data reliability across projects and publications.
Equipment FIB- Focused Ion Beam Brand JEOL JEM-9320FIB Specifications Ion Source Ga liquid-metal source Acc. Voltage 5 to 30 kV (5kV step variable) Magnification ×150 to ×300,000 (LOW MAG ×50) Max.Current 30nA Best image resolution 6nm (@30
| Equipment | FIB- Focused Ion Beam |
|---|---|
| Brand | JEOL JEM-9320FIB |
| Specifications | |
|---|---|
| Ion Source | Ga liquid-metal source |
| Acc. Voltage | 5 to 30 kV (5kV step variable) |
| Magnification | ×150 to ×300,000 (LOW MAG ×50) |
| Max.Current | 30nA |
| Best image resolution | 6nm (@30kV, WD30mm) |
| Tilt angle | ±60° |
| Sample movement | X Y ±1.2mm |
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